Leon Martin Levasier
26Patents
8h-index
97Co-inventors
78Inventor score
Filing activity: Jan 12, 2001 → Oct 2, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7256871B2 | Lithographic apparatus and method for calibrating the same | Physics | 113 | Expired |
| US7292312B2 | Lithographic apparatus and method for calibrating the same | Physics | 107 | Expired |
| US7408655B2 | Lithographic apparatus and method for calibrating the same | Physics | 61 | Active |
| US7528965B2 | Lithographic apparatus and method for calibrating the same | Physics | 60 | Active |
| US7880901B2 | Lithographic apparatus and method for calibrating the same | Physics | 57 | Active |
| US7859686B2 | Lithographic apparatus and method for calibrating the same | Physics | 57 | Active |
| US6710849B2 | Method for calibrating a lithographic projection apparatus and apparatus capable of applying such a method | Physics | 52 | Expired |
| US7239368B2 | Using unflatness information of the substrate table or mask table for decreasing overlay | Physics | 8 | Expired |
| US7002667B2 | Lithographic apparatus with alignment subsystem, device manufacturing method, and device manufactured thereby | Physics | 7 | Expired |
| US8730448B2 | Lithographic apparatus and device manufacturing method | Physics | 6 | Active |
| US7542127B2 | Lithographic apparatus and method for manufacturing a device | Physics | 5 | Expired |
| US8514365B2 | Lithographic apparatus and device manufacturing method | Physics | 5 | Active |
| US6995831B2 | Lithographic apparatus with alignment subsystem, device manufacturing method, using alignment, and alignment structure | Physics | 5 | Expired |
| US7271917B2 | Lithographic apparatus, position quantity detection system and method | Physics | 5 | Expired |
| US6730920B2 | Abbe arm calibration system for use in lithographic apparatus | Physics | 5 | Expired |
| US6955074B2 | Lithographic apparatus, method of calibration, calibration plate, device manufacturing method, and device manufactured thereby | Emerging Cross-Sectional Technologies | 4 | Expired |
| US9983489B2 | Method for compensating for an exposure error, a device manufacturing method, a substrate table, a lithographic apparatus, a control system, a method for measuring reflectivity and a method for measuring a dose of EUV radiation | Physics | 3 | Active |
| US7170580B2 | Lithographic apparatus, projection system, method of projecting and device manufacturing method | Physics | 3 | Expired |
| US8797504B2 | Lithographic apparatus and device manufacturing method | Physics | 1 | Active |
| US11422476B2 | Methods and apparatus for monitoring a lithographic manufacturing process | Physics | 1 | Active |
| US8289498B2 | Lithographic apparatus and device manufacturing method | Physics | 1 | Active |
| US8368902B2 | Lithographic apparatus and method for calibrating the same | Physics | 1 | Active |
| US8351022B2 | Radiation beam modification apparatus and method | Physics | 1 | Active |
| US8477287B2 | Device manufacturing method, lithographic apparatus and a computer program | Physics | 1 | Active |
| US10935895B2 | Lithographic apparatus | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.