Chamber seasoning to improve etch uniformity by reducing chemistry
US10950416B2 · kind B2 · utility
2Cited by
18References
18Claims
0Family size
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Key dates
| Filing date | Oct 21, 2019 |
| Grant date | Mar 16, 2021 |
| Priority date | — |
| Expiry date | Oct 21, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3341
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Processes for surface treatment of a workpiece are provided. In one example implementation, a method can include conducting a pre-treatment process on a processing chamber to generate a hydrogen radical affecting layer on a surface of the processing chamber prior to performing a hydrogen radical based surface treatment process on a workpiece in the processing chamber. In this manner, a pretreatment process can be conducted to condition a processing chamber to increase uniformity of hydrogen radical exposure to a workpiece.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.