Patent assignee · CN · COMPANY

Beijing E-Town Semiconductor Technology Co., Ltd.

113Patents
113Active
113Granted
58Portfolio score

Filing activity: Dec 13, 2016 → Jun 27, 2024

Most-cited patents

PatentTitleAreaCited byStatus
US11062912B2 Atomic layer etch process using plasma in conjunction with a rapid thermal activation process Electricity 7 Active
US11043393B2 Ozone treatment for selective silicon nitride etch over silicon Electricity 4 Active
US11062910B2 Surface treatment of silicon or silicon germanium surfaces using organic radicals Electricity 4 Active
US10804109B2 Surface treatment of silicon and carbon containing films by remote plasma with organic precursors Electricity 3 Active
US10580672B2 Systems and methods for workpiece processing Electricity 3 Active
US11610824B2 Transmission-based temperature measurement of a workpiece in a thermal processing system Physics 2 Active
US10790119B2 Plasma processing apparatus with post plasma gas injection Electricity 2 Active
US10966286B2 Nitrogen injection for ARC lamps Electricity 2 Active
US11049692B2 Methods for tuning plasma potential using variable mode plasma chamber Performing Operations; Transporting 2 Active
US10950416B2 Chamber seasoning to improve etch uniformity by reducing chemistry Electricity 2 Active
US11101142B2 Pre-heat processes for millisecond anneal system Electricity 2 Active
US10580661B2 Atomic layer etch process using plasma in conjunction with a rapid thermal activation process Electricity 2 Active
US10573532B2 Method for processing a workpiece using a multi-cycle thermal treatment process Electricity 1 Active
US10901321B2 Strip process for high aspect ratio structure Electricity 1 Active
US10692730B1 Silicon oxide selective dry etch process Electricity 1 Active
US11348784B2 Enhanced ignition in inductively coupled plasmas for workpiece processing Emerging Cross-Sectional Technologies 1 Active
US10964528B2 Integration of materials removal and surface treatment in semiconductor device fabrication Electricity 1 Active
US11955388B2 Transmission-based temperature measurement of a workpiece in a thermal processing system Physics 1 Active
US11482434B2 Systems and methods for workpiece processing Electricity 1 Active
US11251026B2 Material deposition prevention on a workpiece in a process chamber Electricity 1 Active
US11251075B2 Systems and methods for workpiece processing using neutral atom beams Electricity 1 Active
US11164725B2 Generation of hydrogen reactive species for processing of workpieces Electricity 1 Active
US12002652B2 Variable mode plasma chamber utilizing tunable plasma potential Electricity 1 Active
US11257680B2 Methods for processing a workpiece using fluorine radicals Electricity 1 Active
US11276560B2 Spacer etching process Electricity 1 Active

Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.