Method and apparatus for processing a substrate using non-contact temperature measurement
US10950475B1 · kind B1 · utility
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4References
17Claims
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Key dates
| Filing date | Aug 20, 2019 |
| Grant date | Mar 16, 2021 |
| Priority date | — |
| Expiry date | Aug 20, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J5/10
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods and apparatus for processing a substrate are provided. The apparatus, for example, can include a process chamber comprising a chamber body defining a processing volume and having a view port coupled to the chamber body; a substrate support disposed within the processing volume and having a support surface to support a substrate; and an infrared temperature sensor (IRTS) disposed outside the chamber body adjacent the view port to measure a temperature of the substrate when being processed in the processing volume, the IRTS movable relative to the view port for scanning the substrate through the view port.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.