High power showerhead with recursive gas flow distribution

US10954595B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Hamid Noorbakhsh · Fremont, US
• Xiaoping Zhou · Huzhou City, CN

Key dates

• Filing date: Jul 30, 2019
• Grant date: Mar 23, 2021
• Expiry date: Sep 29, 2039

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/50
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

Embodiments of a showerhead for use in a substrate processing chamber are provided herein. In some embodiments, a showerhead for use in a substrate processing chamber includes an upper plate having an outer gas inlet fluidly coupled to an outer recursive gas path and an inner gas inlet fluidly coupled to an inner recursive gas path; and a lower plate having an upper surface bonded to the upper plate and a lower surface having a plurality of outer gas distribution holes and a plurality of inner gas distribution holes, wherein the upper surface includes an outer recess to define an outer annular gas plenum fluidly coupled to the outer gas inlet and to the plurality of outer gas distribution holes and an inner recess to define one or more inner annular gas plenums fluidly coupled to the inner gas inlet and to the plurality of inner gas distribution holes.