Image based plasma sheath profile detection on plasma processing tools
US10957521B2 · kind B2 · utility
2Cited by
1References
10Claims
0Family size
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Key dates
| Filing date | May 29, 2018 |
| Grant date | Mar 23, 2021 |
| Priority date | — |
| Expiry date | Dec 19, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/26
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A system includes an image processing module configured to receive an image, captured by an imaging device, of a plasma environment within a substrate processing chamber during processing of a substrate and extract one or more features of the image indicative of a plasma sheath formed within the plasma environment during the processing of the substrate. A control module is configured to determine a plasma sheath profile based on the one or more features extracted from the image and selectively adjust at least one processing parameter related to the processing of the substrate based on the plasma sheath profile.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.