Inventor · Fremont, CA, US

Yuhou Wang

16Patents
2h-index
8Co-inventors
39Inventor score

Filing activity: Oct 18, 2017 → Jul 6, 2023

Most-cited inventions

PatentTitleAreaCited byStatus
US10264663B1 Matchless plasma source for semiconductor wafer fabrication Electricity 13 Active
US10638593B2 Matchless plasma source for semiconductor wafer fabrication Electricity 6 Active
US11716805B2 Matchless plasma source for semiconductor wafer fabrication Electricity 2 Active
US10672590B2 Frequency tuning for a matchless plasma source Electricity 2 Active
US10957521B2 Image based plasma sheath profile detection on plasma processing tools Electricity 2 Active
US11342159B2 RF pulsing within pulsing for semiconductor RF plasma processing Electricity 1 Active
US11224116B2 Matchless plasma source for semiconductor wafer fabrication Electricity 1 Active
US11728136B2 RF pulsing within pulsing for semiconductor RF plasma processing Electricity 1 Active
US10879044B2 Auxiliary circuit in RF matching network for frequency tuning assisted dual-level pulsing Electricity 1 Active
US12397435B2 Substrate location detection and adjustment Electricity 0 Active
US12424410B2 RF pulsing within pulsing for semiconductor RF plasma processing Electricity 0 Active
US12261029B2 Protection system for switches in direct drive circuits of substrate processing systems Emerging Cross-Sectional Technologies 0 Active
US12165841B2 Dual-frequency, direct-drive inductively coupled plasma source Electricity 0 Active
US11728137B2 Direct frequency tuning for matchless plasma source in substrate processing systems Emerging Cross-Sectional Technologies 0 Active
US12193138B2 Matchless plasma source for semiconductor wafer fabrication Electricity 0 Active
US11437219B2 Frequency tuning for a matchless plasma source Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.