Patent · US Active

High temperature heater for processing chamber

US10959294B2 · kind B2 · utility

0Cited by
10References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 28, 2016
Grant dateMar 23, 2021
Priority date
Expiry dateJan 9, 2038

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/68771
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Heater assemblies comprising a cylindrical body with a surface and a central axis including a plurality of heating elements are described. The plurality of heating elements is axially spaced on the surface of the cylindrical body. Each of the heating elements forms an axially spaced heating zone. Each heating element has a spiral shape with an inner end and an outer end defining a length of the heating element. Each coil of the spiral shape is spaced from an adjacent coil by a distance sufficient to prevent arcing between adjacent coils.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.