Method for detecting wavefront aberration for optical imaging system based on grating shearing interferometer
US10969274B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 15, 2019 |
| Grant date | Apr 6, 2021 |
| Priority date | — |
| Expiry date | Nov 15, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/706
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Method for detecting wavefront aberration for optical imaging system based on grating shearing interferometer, the grating shearing interferometer system comprising a light source and illumination system, an optical imaging system to be tested, a one-dimensional diffraction grating plate, a two-dimensional diffraction grating plate, a two-dimensional photoelectric sensor, and a computing unit. The one-dimensional and two-dimensional diffraction grating plates are respectively placed on the object plane and the image plane of the optical imaging system to be tested. By collecting interferograms with phase-shifting amounts of 0, π/2, π, 3π/2 and N sets of α, π-α, 2π-α (where, s is the shear ratio of the grating shearing interferometer system), combined with a certain phase retrieval algorithm, the influence of all high-order diffraction beams on the phase retrieval accuracy is eliminated, and finally the detection accuracy of wavefront aberration for the imaging system to be tested is improved.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.