Plasma processing apparatus
US10971341B2 · kind B2 · utility
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2Claims
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Key dates
| Filing date | Sep 10, 2018 |
| Grant date | Apr 6, 2021 |
| Priority date | — |
| Expiry date | Dec 29, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/334
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processing apparatus includes a processing vessel, an upper structure that is provided on an upper portion of the processing vessel and generates plasma in a lower region thereof, a structure holding ring that is fixed around the upper structure, an arm that supports the ring and is movable up and down, a screw (including a bolt) that is fixed to one of the ring and the arm, and has a tip end abutting the other, and a pin that is provided in the ring or the arm, and passes through a hole for restricting horizontal movement of the ring.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.