Positive working photosensitive material
US10976662B2 · kind B2 · utility
0Cited by
21References
38Claims
0Family size
Assignee
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Key dates
| Filing date | Apr 18, 2017 |
| Grant date | Apr 13, 2021 |
| Priority date | — |
| Expiry date | Aug 15, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0397
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present application for patent relates to a light-sensitive positive working photosensitive composition especially useful for imaging thick films using a composition which gives very good film uniformity and promotes a good process latitude against feature pattern collapse in patterns created upon imaging and developing of these films.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.