PingHung Lu
11Patents
4h-index
26Co-inventors
56Inventor score
Filing activity: Aug 10, 2006 → Sep 3, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7638262B2 | Antireflective composition for photoresists | Emerging Cross-Sectional Technologies | 11 | Active |
| US8524441B2 | Silicon-based antireflective coating compositions | Electricity | 9 | Active |
| US8568958B2 | Underlayer composition and process thereof | Physics | 7 | Active |
| US8906594B2 | Negative-working thick film photoresist | Chemistry; Metallurgy | 5 | Active |
| US9012126B2 | Positive photosensitive material | Physics | 3 | Active |
| US8026040B2 | Silicone coating composition | Chemistry; Metallurgy | 2 | Active |
| US7666575B2 | Antireflective coating compositions | Emerging Cross-Sectional Technologies | 1 | Active |
| US10976662B2 | Positive working photosensitive material | Physics | 0 | Active |
| US11698586B2 | Negative-working ultra thick film photoresist | Physics | 0 | Active |
| US12393115B2 | Positive working photosensitive material | Physics | 0 | Active |
| US11385543B2 | Enviromentally stable, thick film, chemically amplified resist | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.