Residual gain monitoring and reduction for EUV drive laser
US10980100B2 · kind B2 · utility
1Cited by
21References
20Claims
0Family size
Assignee
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Key dates
| Filing date | Dec 20, 2019 |
| Grant date | Apr 13, 2021 |
| Priority date | — |
| Expiry date | Dec 20, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/2383
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system includes a laser source operable to provide a laser beam, a laser amplifier having a gain medium operable to provide energy to the laser beam when the laser beam passes through the laser amplifier, and a residual gain monitor operable to provide a probe beam and operable to derive a residual gain of the laser amplifier from the probe beam when the probe beam passes through the laser amplifier while being offset from the laser beam in time or in path.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.