On-device metrology using target decomposition
US10983227B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 13, 2018 |
| Grant date | Apr 20, 2021 |
| Priority date | — |
| Expiry date | Sep 25, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/4735
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods and systems for more efficient X-Ray scatterometry measurements of on-device structures are presented herein. X-Ray scatterometry measurements of one or more structures over a measurement area includes a decomposition of the one or more structures into a plurality of sub-structures, a decomposition of the measurement area into a plurality of sub-areas, or both. The decomposed structures, measurement areas, or both, are independently simulated. The scattering contributions of each of the independently simulated decomposed structures are combined to simulate the actual scattering of the measured structures within the measurement area. In a further aspect, measured intensities and modelled intensities including one or more incidental structures are employed to perform measurement of structures of interest. In other further aspects, measurement decomposition is employed to train a measurement model and to optimize a measurement recipe for a particular measurement application.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.