Substrate processing apparatus and apparatus for manufacturing integrated circuit device
US10985036B2 · kind B2 · utility
3Cited by
17References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 30, 2017 |
| Grant date | Apr 20, 2021 |
| Priority date | — |
| Expiry date | Oct 27, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02101
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate processing apparatus includes a vessel providing a processing space for processing a substrate, a substrate support supporting the substrate loaded in the processing space, and a barrier between a side wall of the vessel and the substrate support and surrounding an edge of the substrate supported by the substrate support.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.