Inventor · Suwon-si, KR

Kun-Tack Lee

56Patents
8h-index
88Co-inventors
81Inventor score

Filing activity: Dec 1, 1999 → Apr 12, 2023

Most-cited inventions

PatentTitleAreaCited byStatus
US7488688B2 Method of removing oxide layer and semiconductor manufacturing apparatus for removing oxide layer Electricity 243 Expired
US8344385B2 Vertical-type semiconductor device Electricity 40 Active
US6565736B2 WET PROCESS FOR SEMICONDUCTOR DEVICE FABRICATION USING ANODE WATER CONTAINING OXIDATIVE SUBSTANCES AND CATHODE WATER CONTAINING REDUCTIVE SUBSTANCES, AND ANODE WATER AND CATHODE WATER USED IN THE WET PROCESS Emerging Cross-Sectional Technologies 24 Expired
US6399552B1 Aqueous cleaning solution for removing contaminants surface of circuit substrate cleaning method using the same Chemistry; Metallurgy 17 Expired
US6610596B1 Method of forming metal interconnection using plating and semiconductor device manufactured by the method Electricity 13 Expired
US6860277B2 Single type of semiconductor wafer cleaning device Emerging Cross-Sectional Technologies 10 Expired
US8766343B2 Integrated circuit capacitors having sidewall supports Electricity 10 Active
US8119476B2 Methods of forming integrated circuit capacitors having sidewall supports and capacitors formed thereby Electricity 9 Active
US6701942B2 Method of and apparatus for removing contaminants from surface of a substrate Emerging Cross-Sectional Technologies 8 Expired
US8084367B2 Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods Emerging Cross-Sectional Technologies 7 Active
US7498217B2 Methods of manufacturing semiconductor memory devices with unit cells having charge trapping layers Electricity 6 Active
US8790470B2 Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods Emerging Cross-Sectional Technologies 6 Active
US7153370B2 Method of cleaning semiconductor wafer Emerging Cross-Sectional Technologies 5 Expired
US7237561B2 Apparatus for cleaning semiconductor wafer including heating using a light source and method for cleaning wafer using the same Emerging Cross-Sectional Technologies 4 Expired
US8585917B2 Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods Emerging Cross-Sectional Technologies 4 Active
US10029332B2 Spot heater and device for cleaning wafer using the same Chemistry; Metallurgy 4 Active
US8110499B2 Method of forming a contact structure Electricity 4 Active
US7265040B2 Cleaning solution and method for selectively removing layer in a silicidation process Chemistry; Metallurgy 3 Expired
US10985036B2 Substrate processing apparatus and apparatus for manufacturing integrated circuit device Electricity 3 Active
US10083829B2 Apparatus for treating substrates using supercritical fluids, substrate treatment system including the same and method of treating substrates using the same Electricity 3 Active
US7745338B2 Method of forming fine pitch hardmask patterns and method of forming fine patterns of semiconductor device using the same Electricity 3 Active
US10576582B2 Spot heater and device for cleaning wafer using the same Chemistry; Metallurgy 2 Active
US8597081B2 Chemical mechanical polishing apparatus having pad conditioning disk and pre-conditioner unit Performing Operations; Transporting 2 Active
US8795541B2 Substrate processing method and substrate processing system for performing the same Electricity 2 Active
US8557651B2 Method of manufacturing a semiconductor device using an etchant Electricity 2 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.