Computational metrology
US10990018B2 · kind B2 · utility
5Cited by
5References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 12, 2018 |
| Grant date | Apr 27, 2021 |
| Priority date | — |
| Expiry date | Feb 12, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2119/22
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method, involving determining a first distribution of a first parameter associated with an error or residual in performing a device manufacturing process; determining a second distribution of a second parameter associated with an error or residual in performing the device manufacturing process; and determining a distribution of a parameter of interest associated with the device manufacturing process using a function operating on the first and second distributions. The function may include a correlation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.