Uniformity control of metal-based photoresists
US10996564B2 · kind B2 · utility
2Cited by
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8Claims
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Key dates
| Filing date | Jan 11, 2018 |
| Grant date | May 4, 2021 |
| Priority date | — |
| Expiry date | Jan 11, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68757
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An EUV photoresist composition includes paramagnetic particles that are adapted to block EUV radiation. The magnetic manipulation of the paramagnetic particles within a deposited layer of EUV photoresist can beneficially impact focus control and the achievable line width roughness during subsequent photolithographic processing. A spin-coating apparatus for dispensing the EUV photoresist composition onto a substrate includes a plurality of concentric electromagnets located beneath the substrate that influence the distribution of the paramagnetic particles in the photoresist layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.