Patent · US Active

Process variability aware adaptive inspection and metrology

US11003093B2 · kind B2 · utility

3Cited by

20References

25Claims

0Family size

Assignee

ASML NETHERLANDS B.V. · NL

Inventors

Venugopal Vellanki · San Jose, US
Vivek Jain · Sammamish, US
Stefan Hunsche · Santa Clara, US

Key dates

Filing date	Nov 26, 2019
Grant date	May 11, 2021
Priority date	—
Expiry date	Nov 26, 2039

Classification

Technology area (CPC G)Physics
CPC primaryG06F2119/18
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A defect prediction method for a device manufacturing process involving processing one or more patterns onto a substrate, the method including; determining values of one or more processing parameters under which the one or more patterns are processed; and determining or predicting, using the values of the one or more processing parameters, an existence, a probability of existence, a characteristic, and/or a combination selected from the foregoing, of a defect resulting from production of the one or more patterns with the device manufacturing process.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.