Stefan Hunsche
47Patents
9h-index
69Co-inventors
78Inventor score
Filing activity: Feb 14, 2002 → Jun 9, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7587704B2 | System and method for mask verification using an individual mask error model | Physics | 224 | Active |
| US7694267B1 | Method for process window optimized optical proximity correction | Physics | 41 | Active |
| US7488933B2 | Method for lithography model calibration | Physics | 38 | Active |
| US7617477B2 | Method for selecting and optimizing exposure tool using an individual mask error model | Physics | 32 | Active |
| US7749666B2 | System and method for measuring and analyzing lithographic parameters and determining optimal process corrections | Physics | 31 | Active |
| US8832610B2 | Method for process window optimized optical proximity correction | Physics | 21 | Active |
| US7139478B2 | Nonlinear device comprising a spectrally broadening fiber | Electricity | 13 | Expired |
| US8413081B2 | Method for process window optimized optical proximity correction | Physics | 11 | Active |
| US8909038B2 | Method and apparatus providing transient control in optical add-drop nodes | Electricity | 10 | Active |
| US11079687B2 | Process window based on defect probability | Physics | 7 | Active |
| US10859926B2 | Methods for defect validation | Physics | 6 | Active |
| US9990451B2 | Process window optimizer | Electricity | 6 | Active |
| US10712672B2 | Method of predicting patterning defects caused by overlay error | Physics | 6 | Active |
| US10514614B2 | Process variability aware adaptive inspection and metrology | Physics | 6 | Active |
| US9958791B2 | Inspection apparatus and methods, substrates having metrology targets, lithographic system and device manufacturing method | Physics | 5 | Active |
| US9645509B2 | Scanner model representation with transmission cross coefficients | Physics | 5 | Active |
| US6859306B2 | Method, apparatus and system for reducing gain ripple in a raman-amplified WDM system | Electricity | 5 | Expired |
| US6867852B2 | Method and apparatus for channel detection | Electricity | 4 | Expired |
| US10437157B2 | Method and apparatus for image analysis | Physics | 4 | Active |
| US10761432B2 | Inspection apparatus and methods, substrates having metrology targets, lithographic system and device manufacturing method | Physics | 3 | Active |
| US11003093B2 | Process variability aware adaptive inspection and metrology | Physics | 3 | Active |
| US10732513B2 | Method and apparatus for image analysis | Physics | 3 | Active |
| US6819480B2 | Method and apparatus for controlling the extinction ratio of transmitters | Physics | 2 | Expired |
| US11238189B2 | Process window optimizer | Electricity | 2 | Active |
| US11443083B2 | Identification of hot spots or defects by machine learning | Physics | 2 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.