System and method for forming diffracted optical element having varied gratings
US11016228B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 9, 2020 |
| Grant date | May 25, 2021 |
| Priority date | — |
| Expiry date | Feb 9, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0005
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Embodiments herein provide systems and methods for forming an optical component. A method may include providing a plurality of proximity masks between a plasma source and a workpiece, the workpiece including a plurality of substrates secured thereto. Each of the plurality of substrates may include first and second target areas. The method may further include delivering, from the plasma source, an angled ion beam towards the workpiece, wherein the angled ion beam is then received at one of the plurality of masks. A first proximity mask may include a first set of openings permitting the angled ion beam to pass therethrough to just the first target area of each of the plurality of substrates. A second proximity mask may include a second set of openings permitting the angled ion beam to pass therethrough just to the second target area of each of the plurality of substrates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.