Optical phase measurement method and system
US11029258B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 24, 2018 |
| Grant date | Jun 8, 2021 |
| Priority date | — |
| Expiry date | Dec 24, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8848
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A measurement system for use in measuring parameters of a patterned sample, the system including a broadband light source, an optical system configured as an interferometric system, a detection unit, and a control unit, where the interferometric system defines illumination and detection channels having a sample arm and a reference arm having a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms, the detection unit for detecting a combined light beam formed by a light beam reflected from the reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by spectral interference signatures, and the control unit for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.