Patent · US Active

Optical element, and method for correcting the wavefront effect of an optical element

US11029515B2 · kind B2 · utility

0Cited by

10References

15Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Kerstin Hild · Schwäbisch Gmünd, DE
Toralf Gruner · Hennef (Sieg), DE
Vitaliy Shklover · Heidenheim, DE

Key dates

Filing date	Aug 31, 2020
Grant date	Jun 8, 2021
Priority date	—
Expiry date	Aug 31, 2040

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70316
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An optical element for an optical system, in particular an optical system of a microlithographic projection exposure apparatus or mask inspection apparatus, and a method for correcting the wavefront effect of an optical element. The optical element has at least one correction layer (12, 22) and a manipulator that manipulates the layer stress in this correction layer such that a wavefront aberration present in the optical system is at least partially corrected by this manipulation. The manipulator has a radiation source for spatially resolved irradiation of the correction layer with electromagnetic radiation (5). This spatially resolved irradiation enables a plurality of spaced apart regions (12a, 12b, 12c, . . . ; 22a, 22b, 22c, . . . ) to be generated, equally modified in terms of their respective structures, in the correction layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.