Device and method for detecting projection objective wave-front aberration

US11029611B2 · kind B2 · utility

Assignee

• Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences · CN

Inventors

• Feng Tang · Geneva, US
• Changzhe Peng · Shanghai, CN
• Xiangzhao Wang · Shanghai, CN
• Yunjun Lu · Shanghai, CN
• Peng Li · 流花街道, CN

Key dates

• Filing date: Nov 19, 2019
• Grant date: Jun 8, 2021
• Expiry date: Nov 19, 2039

Classification

• Technology area (CPC G): Physics
• CPC primary: G01J2009/0219
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

Projection objective wave-front aberration detecting device and a detecting method thereof, wherein the projection objective wave-front aberration detecting device comprises a light source and illuminating system, an object plane grating, an object plane displacement stage, a measured projection objective, an image plane grating, a two-dimensional photoelectric sensor, an image plane displacement stage and a control processing unit. According to the invention, by controlling the length of the object plane grating line, or the periodic structure of the object plane grating perpendicular to the shearing diffraction direction, or the object plane grating to adopt a sinusoidal grating, or the image plane grating to adopt an amplitude-phase hybrid grating, the complexity of an interference field is reduced, and the wave-front aberration detection speed and precision are improved, and the precision and speed of in-situ wave-front aberration detection can be improved.