Hardmask composition, method of forming pattern using hardmask composition, and hardmask formed from hardmask composition
US11034847B2 · kind B2 · utility
0Cited by
21References
23Claims
0Family size
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Key dates
| Filing date | Apr 4, 2018 |
| Grant date | Jun 15, 2021 |
| Priority date | — |
| Expiry date | May 13, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/32139
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided are a hardmask composition including a structure represented by Formula 1 and a solvent, a method of forming a pattern using the hardmask composition, and a hardmask formed from the hardmask composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.