Patent · US Active

Cold sintering of solid precursors

US11035038B2 · kind B2 · utility

2Cited by
8References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 6, 2016
Grant dateJun 15, 2021
Priority date
Expiry dateOct 6, 2036

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC04B2235/604
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

A solid delivery precursor is described, which is useful for volatilization to generate precursor vapor for a vapor deposition process. The solid delivery precursor comprises solid bodies of compacted particulate precursor, e.g., in a form such as pellets, platelets, tablets, beads, discs, or monoliths. When utilized in a vapor deposition process such as chemical vapor deposition, pulsed chemical vapor deposition, or atomic layer deposition, the solid delivery precursor in the form of solid bodies of compacted particulate precursor provide substantially increased flux of precursor vapor when subjected to volatilization conditions, in relation to the particulate precursor. As a result, vapor deposition process operation can be carried out in shorter periods of time, thereby achieving increased manufacturing rates of products such as semiconductor products, flat-panel displays, solar panels, LEDs, optical coatings, and the like.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.