Patent · US Active

Apparatus and method for cleaning reticle stage

US11054756B2 · kind B2 · utility

1Cited by

2References

20Claims

0Family size

Assignee

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. · TW

Inventors

Yu-Fu Lin · Hsinchu, TW
Tung-Jung Chang · Hengshan, TW
Chia-Chen Chen · Hsinchu, TW

Key dates

Filing date	Jun 15, 2020
Grant date	Jul 6, 2021
Priority date	—
Expiry date	Jun 15, 2040

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/709
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An apparatus for cleaning an electrostatic reticle holder used in a lithography system includes a chamber for providing a low pressure environment for the electrostatic reticle holder and an ultrasound transducer configured to apply ultrasound waves to the electrostatic reticle holder. The apparatus further includes a controller configured to control the ultrasound transducer and a gas flow controller. The gas flow controller is configured to enable pressurizing or depressurizing the chamber.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.