Patent · US Active

Apparatus and system having extraction assembly for wide angle ion beam

US11056319B2 · kind B2 · utility

2Cited by

3References

17Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Costel Biloiu · Rockport, US
Appu Naveen Thomas · Danvers, US
Tyler Rockwell · Wakefield, US
Frank Sinclair · Quincy, US
Christopher Campbell · Newburyport, US

Key dates

Filing date	Jul 29, 2019
Grant date	Jul 6, 2021
Priority date	—
Expiry date	Jul 29, 2039

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/061
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

An ion beam processing apparatus may include a plasma chamber, and a plasma plate, disposed alongside the plasma chamber, where the plasma plate defines a first extraction aperture. The apparatus may include a beam blocker, disposed within the plasma chamber and facing the extraction aperture. The apparatus may further include a non-planar electrode, disposed adjacent the beam blocker and outside of the plasma chamber; and an extraction plate, disposed outside the plasma plate, and defining a second extraction aperture, aligned with the first extraction aperture.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.