Patent · US Active

Method and apparatus for ascertaining a repair shape for processing a defect of a photolithographic mask

US11079674B2 · kind B2 · utility

0Cited by

6References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Jens Oster · Ober-Ramstadt, DE
Markus Waiblinger · Dresden, DE

Key dates

Filing date	Sep 6, 2019
Grant date	Aug 3, 2021
Priority date	—
Expiry date	Nov 26, 2039

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/84
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The present invention relates to a method for ascertaining a repair shape for processing at least one defect of a photolithographic mask including the following steps: (a) determining at least one correction value for the repair shape of the at least one defect, wherein the correction value takes account of a position of at least one pattern element of the photolithographic mask, said at least one pattern element not contacting the at least one defect; and (b) correcting the repair shape by applying the at least one correction value.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.