Markus Waiblinger
5Patents
1h-index
9Co-inventors
40Inventor score
Filing activity: Nov 17, 2006 → Sep 6, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7820343B2 | Method for producing a photomask, method for patterning a layer or layer stack and resist stack on a mask substrate | Physics | 1 | Active |
| US9990737B2 | Apparatus and method for correlating images of a photolithographic mask | Electricity | 1 | Active |
| US7811727B2 | Method for determining an exposure dose and exposure apparatus | Emerging Cross-Sectional Technologies | 0 | Active |
| US9431212B2 | Method for determining the performance of a photolithographic mask | Physics | 0 | Active |
| US11079674B2 | Method and apparatus for ascertaining a repair shape for processing a defect of a photolithographic mask | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.