Jens Oster
4Patents
1h-index
10Co-inventors
37Inventor score
Filing activity: Feb 24, 2017 → Jul 7, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10372032B2 | Method and device for permanently repairing defects of absent material of a photolithographic mask | Electricity | 1 | Active |
| US11079674B2 | Method and apparatus for ascertaining a repair shape for processing a defect of a photolithographic mask | Physics | 0 | Active |
| US10732501B2 | Method and device for permanently repairing defects of absent material of a photolithographic mask | Electricity | 0 | Active |
| US11886126B2 | Apparatus and method for removing a single particulate from a substrate | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.