Patent · US Active

Device to increase deposition uniformity in spatial ALD processing chamber

US11085129B2 · kind B2 · utility

0Cited by

2References

20Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Joseph Yudovsky · Campbell, US
Alexander S. Polyak · Palm Coast, US

Key dates

Filing date	Nov 15, 2019
Grant date	Aug 10, 2021
Priority date	—
Expiry date	Nov 15, 2039

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C16/4584
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

Susceptor assemblies comprising a susceptor with a top surface with a plurality of recesses and a bottom surface are described. A heater is positioned below the susceptor to heat the susceptor. A shield is positioned between the bottom surface of the susceptor and the heater. The shield increases deposition uniformity across the susceptor.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.