Hardmask composition and method of forming pattern using the hardmask composition
US11086223B2 · kind B2 · utility
1Cited by
18References
5Claims
0Family size
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Key dates
| Filing date | May 30, 2019 |
| Grant date | Aug 10, 2021 |
| Priority date | — |
| Expiry date | Feb 3, 2040 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2201/0132
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A hardmask composition may include graphene nanoparticles having a size in a range of about 5 nm to about 100 nm and a solvent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.