Metrology sensor, lithographic apparatus and method for manufacturing devices
US11086240B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 15, 2017 |
| Grant date | Aug 10, 2021 |
| Priority date | — |
| Expiry date | Feb 16, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7076
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a metrology sensor system, such as a position sensor. The system comprises an optical collection system configured to collect diffracted or scattered radiation from a metrology mark on a substrate, said collected radiation comprising at least one parameter-sensitive signal and noise signal which is not parameter-sensitive, a processing system operable to process the collected radiation; and a module housing. An optical guide is provided for guiding the at least one parameter-sensitive signal, separated from the noise signal, from the processing system to a detection system outside of the housing. A detector detects the separated at least one parameter-sensitive signal. An obscuration for blocking zeroth order radiation and/or a demagnifying optical system may be provided between the optical guide and the detector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.