Substrate rack and a substrate processing system and method
US11088002B2 · kind B2 · utility
5Cited by
1,993References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 29, 2018 |
| Grant date | Aug 10, 2021 |
| Priority date | — |
| Expiry date | Mar 29, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67757
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The invention relates to a substrate rack and a substrate processing system for processing substrates in a reaction chamber. The substrate rack may be used for introducing a plurality of substrates in the reaction chamber. The substrate rack may have a plurality of spaced apart substrate holding provisions configured to hold the substrates in a spaced apart relationship. The rack may have an illumination system to irradiate radiation with a range from 100 to 500 nanometers onto a top surface of the substrates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.