Method and apparatus for detecting substrate surface variations
US11092902B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 17, 2018 |
| Grant date | Aug 17, 2021 |
| Priority date | — |
| Expiry date | May 17, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8829
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Disclosed is a method and associated inspection apparatus for detecting variations on a surface of a substrate. The method comprises providing patterned inspection radiation to a surface of a substrate. The inspection radiation is patterned such that an amplitude of a corresponding enhanced field is modulated in a manner corresponding to the patterned inspection radiation. The scattered radiation resultant from interaction between the enhanced field and the substrate surface is received and variations on the surface of the substrate are detected based on the interaction between the enhanced field and the substrate surface. Also disclosed is a method of detecting any changes to at least one characteristic of received radiation, the said changes being induced by the generation of a surface plasmon at said surface of the optical element.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.