Patent · US Active

Inspection device and contact method

US11099236B2 · kind B2 · utility

1Cited by
2References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 1, 2018
Grant dateAug 24, 2021
Priority date
Expiry dateApr 11, 2038

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01R31/2831
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

An inspection device includes a chuck top that holds a wafer, a probe card disposed to face the wafer held by the chuck top and having a plurality of contact probes on a surface facing the wafer, a pogo frame that holds the probe card, a bellows that surrounds the probe card and the contact probes and forms a sealed space when the wafer is close to or in contact with the contact probes, a gas exhaust path configured to depressurize the pressure in the sealed space, and a mechanical stopper that is provided between the pogo frame and the chuck top and restricts the vertical inclination of the chuck top when a predetermined contact is made between the wafer and the contact probes.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.