Apparatus for treating exhaust gas in a processing system
US11110392B2 · kind B2 · utility
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10Claims
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Key dates
| Filing date | Jun 3, 2019 |
| Grant date | Sep 7, 2021 |
| Priority date | — |
| Expiry date | Jun 26, 2039 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02C20/30
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Methods and apparatus for treating an exhaust gas in a foreline of a substrate processing system are provided herein. In some embodiments, a method for treating an exhaust gas in an exhaust conduit of a substrate processing system includes: flowing an exhaust gas from a process chamber into a plasma source via a foreline; injecting a reagent into the foreline; forming a plasma in the plasma source from the exhaust gas and the reagent; and injecting a cleaning gas into the foreline, wherein the cleaning gas and the reagent are different gases.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.