Patent · US Active

Methods and apparatus of processing transparent substrates

US11111176B1 · kind B1 · utility

1Cited by

3References

18Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Yongan Xu · Niskayuna, US
Chien-An Chen · Holly Springs, US
Ludovic Godet · Sunnyvale, US

Key dates

Filing date	Feb 27, 2020
Grant date	Sep 7, 2021
Priority date	—
Expiry date	Feb 27, 2040

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC03C2218/365
WIPO fieldMaterials, metallurgy
WIPO sectorChemistry

Abstract

Aspects of the present disclosure relate generally to methods and apparatus of processing transparent substrates, such as glass substrates. In one implementation, a film stack for optical devices includes a glass substrate including a first surface and a second surface. The film stack includes a device function layer formed on the first surface, a hard mask layer formed on the device function layer, and a substrate recognition layer formed on the hard mask layer. The hard mask layer includes one or more of chromium, ruthenium, or titanium nitride. The film stack includes a backside layer formed on the second surface. The backside layer formed on the second surface includes one or more of a conductive layer or an oxide layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.