Patent · US Active

Manufacturing methods for mandrel pull from spacers for multi-color patterning

US11127594B2 · kind B2 · utility

0Cited by
2References
27Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 6, 2018
Grant dateSep 21, 2021
Priority date
Expiry dateJun 7, 2039

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/32139
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Embodiments are disclosed for processing microelectronic workpieces having patterned structures to improve mandrel pull from spacers for multi-color patterning. The disclosed embodiments form patterned structures on a substrate including mandrels, form spacers adjacent the mandrels that are recessed such that a height of the spacers is less than the height of the mandrels, form protective caps over the spacers while exposing top surfaces of the mandrels, and remove the mandrels to leave a spacer pattern with cap protection. The remaining spacer pattern can then be transferred to underlying layers in additional process steps. The recessing of the spacers and formation of the protective caps tends to reduce or eliminate spacer damage suffered by prior solutions during mandrel pull from spacers for multi-color patterning.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.