Patent · US Active

High temperature electrostatic chuck

US11133212B2 · kind B2 · utility

0Cited by
7References
15Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 11, 2019
Grant dateSep 28, 2021
Priority date
Expiry dateApr 11, 2039

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/67103
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A substrate support is disclosed. The substrate support has a dielectric body with a plurality of features formed thereon. A ledge surrounds the plurality of features about a periphery thereof. The features increase in number from a central region of the substrate support towards the ledge. A seasoning layer is optionally disposed on the dielectric body.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.