Liquid dispensing nozzle and substrate treating apparatus
US11148150B2 · kind B2 · utility
11Cited by
1References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 21, 2019 |
| Grant date | Oct 19, 2021 |
| Priority date | — |
| Expiry date | Oct 21, 2039 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05B15/652
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The inventive concept relates to a liquid dispensing nozzle and an apparatus for treating a substrate. The liquid dispensing nozzle includes a first fluid channel that is formed in the nozzle and through which a processing liquid flows and a second fluid channel in communication with the first fluid channel, the second fluid channel being connected to a dispensing end of the nozzle. The second fluid channel has a larger width than the first fluid channel, and a central axis of the first fluid channel and a central axis of the second fluid channel are connected with each other in a straight line.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.