Strain and kinetics control during separation phase of imprint process

US11161280B2 · kind B2 · utility

Assignee

• Molecular Imprints, Inc. · US

Inventors

• Niyaz Khusnatdinov · Round Rock, US
• Frank Y. Xu · Round Rock, US
• Mario Johannes Meissl · Austin, US
• Michael Nevin Miller · Austin, US
• Ecron D. Thompson · Round Rock, US
• Gerard Schmid · Guilford, US
• Pawan Kumar Nimmakayala · Austin, US
• Xiaoming Lu · Cedar Park, US
• Byung-Jin Choi · Round Rock, US

Key dates

• Filing date: Jan 31, 2019
• Grant date: Nov 2, 2021
• Expiry date: Jul 8, 2039

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/0002
• WIPO field: Micro-structural and nano-technology
• WIPO sector: Chemistry

Abstract

Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.