Misregistration metrology by using fringe Moiré and optical Moiré effects
US11164307B1 · kind B1 · utility
10Cited by
8References
35Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 21, 2020 |
| Grant date | Nov 2, 2021 |
| Priority date | — |
| Expiry date | Jul 21, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A metrology system and metrology methods are disclosed. The metrology system includes an illumination sub-system, a collection sub-system, a detector, and a controller. The controller is configured to receive an image of an overlay target on a sample, determine an apparent overlay between two working zones along a measurement direction based on the image, and calculate an overlay between the two sample layers by dividing the apparent overlay by a Moiré gain to compensate for Moiré interference.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.