Evgeni Gurevich
8Patents
2h-index
35Co-inventors
43Inventor score
Filing activity: Jun 30, 2016 → Dec 6, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11164307B1 | Misregistration metrology by using fringe Moiré and optical Moiré effects | Physics | 10 | Active |
| US10831108B2 | Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology | Electricity | 2 | Active |
| US11256177B2 | Imaging overlay targets using Moiré elements and rotational symmetry arrangements | Physics | 1 | Active |
| US10901325B2 | Determining the impacts of stochastic behavior on overlay metrology data | Electricity | 0 | Active |
| US11862522B2 | Accuracy improvements in optical metrology | Electricity | 0 | Active |
| US12013634B2 | Reduction or elimination of pattern placement error in metrology measurements | Physics | 0 | Active |
| US11537043B2 | Reduction or elimination of pattern placement error in metrology measurements | Physics | 0 | Active |
| US12105433B2 | Imaging overlay targets using moiré elements and rotational symmetry arrangements | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.