Method of enhancing selective deposition by cross-linking of blocking molecules
US11164745B2 · kind B2 · utility
1Cited by
1References
19Claims
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Key dates
| Filing date | Aug 1, 2018 |
| Grant date | Nov 2, 2021 |
| Priority date | — |
| Expiry date | Aug 1, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/76879
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Methods of depositing a film selectively onto a first substrate surface relative to a second substrate surface are described. The methods include exposing a substrate to a blocking molecule to selectively deposit a blocking layer on the first surface. The blocking layer is exposed to a polymer initiator to form a networked blocking layer. A layer is selectively formed on the second surface. The blocking layer inhibits deposition on the first surface. The networked layer may then optionally be removed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.