Inventor · Santa Clara, CA, US

Mark Saly

105Patents
5h-index
140Co-inventors
73Inventor score

Filing activity: Mar 1, 2012 → Feb 1, 2024

Most-cited inventions

PatentTitleAreaCited byStatus
US8728955B2 Method of plasma activated deposition of a conformal film on a substrate surface Electricity 62 Active
US9175023B2 Molybdenum allyl complexes and use thereof in thin film deposition Chemistry; Metallurgy 17 Active
US10633740B2 Methods for depositing coatings on aerospace components Mechanical Engineering; Lighting; Heating 16 Active
US11028480B2 Methods of protecting metallic components against corrosion using chromium-containing thin films Mechanical Engineering; Lighting; Heating 12 Active
US9911591B2 Selective deposition of thin film dielectrics using surface blocking chemistry Electricity 5 Active
US9875888B2 High temperature silicon oxide atomic layer deposition technology Electricity 3 Active
US9520284B1 Ion beam activated directional deposition Electricity 3 Active
US10023958B2 Atomic layer deposition of films comprising silicon, carbon and nitrogen using halogenated silicon precursors Chemistry; Metallurgy 3 Active
US11621172B2 Vapor phase thermal etch solutions for metal oxo photoresists Physics 2 Active
US11028477B2 Bottom-up gap-fill by surface poisoning treatment Electricity 2 Active
US11342481B2 Preclean and encapsulation of microLED features Electricity 2 Active
US11447865B2 Deposition of low-κ films Chemistry; Metallurgy 2 Active
US11848229B2 Selective blocking of metal surfaces using bifunctional self-assembled monolayers Electricity 1 Active
US11164745B2 Method of enhancing selective deposition by cross-linking of blocking molecules Electricity 1 Active
US11398388B2 Methods for selective dry etching gallium oxide Electricity 1 Active
US9812318B2 Low temperature molecular layer deposition of SiCON Electricity 1 Active
US10170298B2 High temperature silicon oxide atomic layer deposition technology Electricity 1 Active
US9177783B2 Substituted silacyclopropane precursors and their use for the deposition of silicon-containing films Electricity 1 Active
US11649560B2 Method for forming silicon-phosphorous materials Electricity 0 Active
US11371136B2 Methods for selective deposition of dielectric on silicon oxide Electricity 0 Active
US11536708B2 Methods to fabricate dual pore devices Performing Operations; Transporting 0 Active
US11732356B2 Multilayer encapsulation stacks by atomic layer deposition Electricity 0 Active
US11549181B2 Methods for atomic layer deposition of SiCO(N) using halogenated silylamides Chemistry; Metallurgy 0 Active
US9685325B2 Carbon and/or nitrogen incorporation in silicon based films using silicon precursors with organic co-reactants by PE-ALD Electricity 0 Active
US12291779B2 Methods of selective atomic layer deposition Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.