Gas-pulsing-based shared precursor distribution system and methods of use

US11169547B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Michael R. Rice · Pleasanton, US
• Joseph AuBuchon · San Jose, US
• Sanjeev Baluja · Campbell, US
• Ashley M. Okada · San Jose, US
• Alexander Fernandez · San Francisco, US
• Ming Xu · Nanjing, CN
• Marcel E. Josephson · San Jose, US
• Sushant S. Koshti · Sunnyvale, US
• Kenneth Le · Fremont, US
• Kevin Brashear · San Jose, US

Key dates

• Filing date: Apr 27, 2019
• Grant date: Nov 9, 2021
• Expiry date: Apr 27, 2039

Classification

• Technology area (CPC G): Physics
• CPC primary: G01F25/17
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

Gas distribution apparatus to provide uniform flows of gases from a single source to multiple processing chambers are described. A regulator is positioned at an upstream end of a shared volume having a plurality of downstream ends. A flow controller is positioned at each downstream end of the shared volume, the flow controller comprising an orifice and a fast pulsing valve. Methods of using the gas distribution apparatus and calibrating the flow controllers are also described.