Sanjeev Baluja
100Patents
11h-index
139Co-inventors
83Inventor score
Filing activity: Jan 15, 2004 → Jul 2, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7566891B2 | Apparatus and method for treating a substrate with UV radiation using primary and secondary reflectors | Performing Operations; Transporting | 523 | Active |
| US8911553B2 | Quartz showerhead for nanocure UV chamber | Emerging Cross-Sectional Technologies | 457 | Active |
| US7692171B2 | Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectors | Physics | 451 | Active |
| US8338809B2 | Ultraviolet reflector with coolant gas holes and method | Physics | 391 | Active |
| US8203126B2 | Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation | Electricity | 26 | Active |
| US7663121B2 | High efficiency UV curing system | Electricity | 23 | Active |
| US7589336B2 | Apparatus and method for exposing a substrate to UV radiation while monitoring deterioration of the UV source and reflectors | Performing Operations; Transporting | 21 | Active |
| US7777198B2 | Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation | Electricity | 19 | Active |
| US7909595B2 | Apparatus and method for exposing a substrate to UV radiation using a reflector having both elliptical and parabolic reflective sections | Performing Operations; Transporting | 12 | Active |
| US8274017B2 | Multifunctional heater/chiller pedestal for wide range wafer temperature control | Electricity | 11 | Active |
| US7964858B2 | Ultraviolet reflector with coolant gas holes and method | Physics | 11 | Active |
| US8753449B2 | Enhancement in UV curing efficiency using oxygen-doped purge for ultra low-K dielectric film | Electricity | 9 | Active |
| USD1037778S1 | Gas distribution plate | General | 8 | Active |
| US7226269B2 | Substrate edge grip apparatus | Emerging Cross-Sectional Technologies | 7 | Expired |
| US8455849B2 | Method and apparatus for modulating wafer treatment profile in UV chamber | Electricity | 7 | Active |
| US8679987B2 | Deposition of an amorphous carbon layer with high film density and high etch selectivity | Electricity | 6 | Active |
| US8657961B2 | Method for UV based silylation chamber clean | Electricity | 5 | Active |
| US8309421B2 | Dual-bulb lamphead control methodology | Electricity | 4 | Active |
| US9364871B2 | Method and hardware for cleaning UV chambers | Chemistry; Metallurgy | 4 | Active |
| US8841629B2 | Microwave excursion detection for semiconductor processing | Electricity | 3 | Active |
| US7554103B2 | Increased tool utilization/reduction in MWBC for UV curing chamber | Electricity | 3 | Active |
| US8597011B2 | Apparatus and method for exposing a substrate to UV radiation using a reflector having both elliptical and parabolic reflective sections | Performing Operations; Transporting | 3 | Active |
| US10490436B2 | Enhanced lift pin design to eliminate local thickness non-uniformity in teos oxide films | Electricity | 3 | Active |
| US11430686B2 | Pedestal heater for spatial multi-wafer processing tool | Electricity | 3 | Active |
| US9506145B2 | Method and hardware for cleaning UV chambers | Chemistry; Metallurgy | 3 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.