Substrate treatment apparatus
US11171020B2 · kind B2 · utility
0Cited by
9References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 22, 2019 |
| Grant date | Nov 9, 2021 |
| Priority date | — |
| Expiry date | Aug 22, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67253
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate treatment apparatus according to an embodiment includes a treatment tank, a container, a measuring instrument, and a controller. The treatment tank stores a chemical solution to treat a substrate. The container contains a liquid including ammonia from which a gas discharged from the treatment tank is gas-liquid separated. The measuring instrument measures an amount of the ammonia included in the liquid over time. The controller controls the treatment of the substrate based on the amount of the ammonia.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.